From our humble beginnings to global photomask technology leader, each achievement along the way led to the next. Through the support and trust of our customers, the dedication and expertise of our employees, and tremendous contributions from our partners and stakeholders, we have achieved significant milestones. Today, we are a global leader in reticles and photomask technologies and solutions. We thank everyone who has been part of our long and successful journey to get here. See our historical timeline below.
1969
Photronic Labs, Inc., is founded in Danbury, CT.
1978
Responding to rapid growth, the Company relocates from Danbury to a larger facility in neighboring Brookfield, CT.
1982
The first electron-beam lithography system, a MEBES I, is installed.
1985
A new 20,000-square-foot building is added to the Brookfield campus to accommodate continuing expansion.
1987
An initial public offering is completed. The Company is listed on the NASDAQ under the symbol PLAB.
1989
The captive photomask manufacturing operations of Martin Marietta Corporation are acquired and integrated into the Brookfield facility.
1990
Photronic Labs, Inc., is renamed Photronics, Inc. A second public equity offering is completed.
1991
The captive photomask manufacturing operations of Analog Devices are acquired. A third public equity offering is completed.
1992
The captive photomask manufacturing operations and assets of Unisys Corporation are acquired.
1993
Photronics acquires photomask operations of Toppan Printonics (formerly Texas Instruments photomask shop), and Raytheon Company.
1994
Ground is broken in Allen, Texas, and independent photomask manufacturer Hoya Micro Mask, Inc., is acquired.
1995
Plans to begin manufacturing operations in Singapore are announced. Acquisitions include Microphase Laboratories, Inc. and GEC Plessey Semiconductors’ captive photomask operations (first wholly owned manufacturing site outside of North America).
1996
Photronics makes a minority equity investment in PK Ltd., entering Korea and flat panel display market. In Europe, the photomask manufacturing operations of CSEM Litomask in Neuchâtel, Switzerland, are acquired, and ground is broken in Manchester, England.
1997
Photronics acquires the captive photomask manufacturing operations of Motorola in the US, and MZD, an independent photomask manufacturer in Dresden, Germany.
1998
Photronics becomes the first photomask supplier to join IMEC, a Europe-based, not-for-profit research consortium.
1999
Photronics and IBM form the Next Generation Lithography Mask Center of Competency (NGL-MCOC).
2000
Photronics acquires a majority share of Taiwan-based Precision Semiconductor Mask Corporation (PSMC), and completes merger with Align-Rite International, Inc., creating one of the largest and fastest-growing strategic photomask suppliers.
2001
With MIT Lincoln Laboratory, Photronics develops Sub-Wavelength Reticle SolutionsTM phase-shift photomasks that demonstrates ability to produce sub-100nm features. Photronics acquires Conexant’s captive photomask shop.
2002
Photronics introduces CyberMaskTM, a proprietary software suite that facilitates a seamless interface with semiconductor manufacturers to receive and prepare integrated circuit design data for reticle manufacturing.
2004
Rochester Institute of Technology and Photronics partner to produce the first demonstration of 45nm node wafer imaging technology utilizing an immersion lithography system.
2005
Photronics begins construction on new flat panel display mask fabrication facility to expand FPD manufacturing infrastructure into Taiwan.
2006
Photronics announces joint venture with Micron Technology (MP Mask Technology Center) to develop and produce leading-edge photomasks; and breaks ground on new state-of-the-art, wholly owned facility in Boise, ID.
2007
Photronics expands production capacity and adds G7.5 capability to Taichung, Taiwan, flat panel display manufacturing facility.
2008
Boise ships its first production reticle.
2014
Photronics creates PDMC joint venture in Taiwan with Dai Nippon Printing to become largest merchant photomask supplier in strategically important Taiwan market.
2015
Photronics promotes Dr. Peter Kirlin to chief executive officer. and enters into strategic supply and technology agreement with Micron Technology, Inc.
2016
Photronics announces $160 million investment to build state-of-the-art IC manufacturing facility in Xiamen, China.
2017
Photronics announces a $160 million investment to build state-of-the-art FPD manufacturing facility in Hefei, China.
2018
Photronics forms second joint venture with Dai Nippon Printing, extending successful IC partnership that begin in Taiwan in 2014 to now include all sales, marketing, distribution and manufacturing in China, including the facility in Xiamen.
2019
Photronics celebrates grand opening and ramps production of two China high-end manufacturing facilities.